Dursox® is a thin but durable silicon oxide (SiO) high purity barrier coating process that prevents semiconductor tool corrosion and erosion. Our patented CVD process bonds super high purity silicon to stainless steel, alloy, glass, and ceramic surfaces. The micro-thin coating penetrates small holes, inner cavities, and narrow bore tubes without significant change in component tolerance. Dursox will deform with part surfaces, allowing a leak-free seal or radius bend while maintaining high dimensional tolerance.
High purity coating eliminates ion contamination in corrosive etch gas streams.
Enhance purity by coating of all chambers and equipment. Reduces carryover, burn-in, and corrosion.
Stabilize flow path to assure ozone purity.
Reduce contamination and maintenance caused by corrosion.
Comparative corrosion testing shows that Dursox improves corrosion resistance by an order of magnitude when compared to uncoated stainless steel. ASTM G31 72 hour immersion in 6m hydrochloric acid (below) tells the story. Thick or thin coating of Dursox will improve corrosion resistance by 10x.
If you have a technical question about how our coating technologies will perform in your application, contact our Technical Service Team and ask the experts.
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To get the most out of your process flow path and instrumentation coat all flow path components and systems in a variety of semiconductor applications. This includes:
|Etch||High purity coating eliminates ion contamination in corrosive etch gas streams.|
|Atomic Layer Deposition (ALD)||Enhance purity by coating of all chambers and equipment. Reduces carryover, burn-in, and corrosion.|
|Ozone||Stabilize flow path to assure ozone purity.|
|Gas Transfer||Prevent ion contamination, assure high purity gases.|
|Chemical-Mechanical Planarization (CMP)||Increase lubricity, prevent sticking and cut downtime.|
|Epitaxy||Significantly reduces contamination and maintenance caused by corrosion.|
Coat any critical flow path component, including:
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Dursox® is a non reactive high temperature corrosion resistant coating
Dursox® is a high purity silicon oxide layer that contains no metals, assuring no leaching of metal ions into process streams. X-ray photoelectron spectroscop (XPS) data (below) show our CVD coating contains only silicon, oxygen and carbon, making it the ideal barrier coating for semiconductor manufacturing applications or wherever high purity corrosion resistance is needed.
Dursox® CVD coating protects parts from corrosive attack while making the surface non reactive and contaminant free, improving yield, eliminating process contamination and reducing tool burn-in.
Dursox® is superior to ceramic coatings like yttria, offering better stability, no delamination, and improved durability even in high stress areas like conflat sealing surfaces commonly used in research applications.